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Handbook of Photomask Manufacturing Technology

By Syed Rizvi

Handbook of Photomask Manufacturing Technology Business & Technology

Handbook of Photomask Manufacturing Technology

0 - Default Title
Description
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it is increasingly important for new technologies to keep pace with these demands. Photomask technology is one of the key areas to achieving this goal. This valuable reference provides a comprehensive summary of all areas of mask technology in a single work, featuring contributions from 40 internationally reputable authors from industry, academia, government, national labs, and consortia. They discuss conventional masks and their supporting technologies, as well as next-generation technologies such as extreme ultraviolet, electron projection, ion projection, and X-ray lithography.
Product details
Edition:
illustrated
Number of Pages:
730
Release Date:
2005-06-01
Publication Date:
2005-04-07
Publisher:
CRC Press
Languages:
Original: English
ISBN10:
08247537470824747690
ISBN13:
9780824753740
GPSR Manufacturer Reference:
[email protected]
Weight:
1544 g
Height:
183 cm
Width:
260 cm
Thickness:
43 cm
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