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Plasma Etching

Plasma Etching

0 - Default Title
Description
This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.
Product details
Edition:
illustrated
Number of Pages:
360
Release Date:
1998-07-30
Publication Date:
1998-05-28
Publisher:
OUP Oxford
Languages:
Original: English
ISBN10:
019856287X
ISBN13:
9780198562870
GPSR Manufacturer Reference:
Weight:
705 g
Height:
161 cm
Width:
240 cm
Thickness:
24 cm
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