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Photoresist Technology in Microsystems: Principles, Processes and Applications

By Kaiying Wang

Photoresist Technology in Microsystems: Principles, Processes and Applications

By Kaiying Wang

0 - Default Title
Description
1. Introduction to Photoresist Technology.- 2. Fundamentals of Photoresist Chemistry.- 3. Microsystems Fabrication Processes.- 4. Advanced Photoresist Materials for Microsystems.- 5. Photoresist Processing Techniques.- 6. Photoresist Applications in Microsystems.- 7. High-Aspect-Ratio Lithography for Microsystems.- 8. Challenges in Photoresist Technology for Microsystems.- 9. Emerging Trends in Photoresist Technology.- 10. Future Perspectives.
Product details
Number of Pages:
196
Release Date:
2025-10-15
Publication Date:
2025-10-15
Publisher:
Springer
Languages:
Original: English
ISBN10:
9819516056
ISBN13:
9789819516056
GPSR Manufacturer Reference:
[email protected]
Weight:
499 g
Height:
160 cm
Width:
241 cm
Thickness:
16 cm
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