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Atomic Layer Deposition

By Cameron, David C

Atomic Layer Deposition Natural Sciences

Atomic Layer Deposition

By Cameron, David C

0 - Default Title
Description
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component compounds to elemental metals and structures with compositions that can be adjusted over the thickness of the film. It has expanded from a small-scale batch process to large scale production, also including continuous processing - known as spatial ALD. It has matured into an industrial technology essential for many areas of materials science and engineering from microelectronics to corrosion protection. Its attributes make it a key technology in studying new materials and structures over an enormous range of applications. This Special Issue contains six research articles and one review article that illustrate the breadth of these applications from energy storage in batteries or supercapacitors to catalysis via x-ray, UV, and visible optics.
Product details
Number of Pages:
142
Release Date:
2020-08-11
Publication Date:
2020-08-11
Publisher:
MDPI AG
Languages:
Original: English
ISBN10:
3039366521
ISBN13:
9783039366521
GPSR Manufacturer Reference:
[email protected]
Weight:
555 g
Height:
175 cm
Width:
250 cm
Thickness:
14 cm
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