Placeholder text

Go to cart

Development of Nickel Oxide Thin Films for Environmental Gas Sensing

By Ambi, Ravishankar Ramesh

Development of Nickel Oxide Thin Films for Environmental Gas Sensing Natural Sciences

Development of Nickel Oxide Thin Films for Environmental Gas Sensing

0 - Default Title
Description
This book deals with the synthesis and characterization of NiO deposited by Chemical Bath Deposition method using solution of Ni(NO3)2.6H2O. X-ray diffraction investigation showed cubic crystal structure of NiO with preferred orientation along (200). The scanning electron microscopy images exhibited a porous structure morphology composed of nanosheets. The network of linked nanosheets and voids offers a large number of pathways and more reactive sites for gas diffusion. TEM image reveals an average size of 5 nm for NiO. AFM reveals roughness of 107.9 nm for NiO deposited at 7 h. BET measurement gives the specific surface area of 110.42 m2g-1. The XPS study showed that the presence of mixed Ni2+ and Ni3+ chemical states of Ni at about 853.70 and 855.44 eV, respectively on the NiO surface due to non-stoichiometry of the film. The direct band gap energy of around 3.6-3.7 eV was obtained by UV-Vis measurement for all NiO films. 45.6% response is obtained to 100 ppm NO2 at 200 °C with T_response = 13 s and T_recovery = 146 s. The highest response of 45.6% to 100 ppm NO2 showed that NiO is a good candidate for environmental monitoring at moderate working temperature of 200 °C.
Product details
Binding:
Paperback
Number of Pages:
92
Release Date:
2025-09-29
Publication Date:
2025-09-29
Publisher:
LAP LAMBERT Academic Publishing
Languages:
Original: English
ISBN10:
620748407X
ISBN13:
9786207484072
GPSR Manufacturer Reference:
[email protected]
Weight:
155 g
Height:
150 cm
Width:
220 cm
Thickness:
6 cm
Buy on Amazon
Currently sold out